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High-Precision Wet Benches for 8-Inch Wafer Processing in European Semiconductor Research

A demanding large-scale project in semiconductor technology and microelectronics for a leading European research institute.

Integrated Wet Processing Platform for Semiconductor R&D

Precision Wet Chemistry for Advanced Semiconductor Development.

Custom Wet Benches for Leading High-Tech Company

manuelle Nassbank Halbleiter

Specialized Wet Benches for Highest Requirements in Semiconductor Manufacturing

State-of-the-Art Wet Bench for Semiconductor Cleaning and Chemical Processes

PaceTec developed and implemented a highly complex manual wet bench for demanding cleaning and etching processes in semiconductor manufacturing.

GaAs Wet Bench for Resist Strip and Lift-Off Processes in Semiconductor Manufacturing

PaceTec delivered a customized wet bench solution for surface treatment and resist processing of GaAs wafers for applications in modern semiconductor manufacturing.

Precision in Ozone-Based Semiconductor Cleaning

Continuous miniaturization in the semiconductor industry places the highest demands on wet chemical cleaning and oxidation processes.

Wafer surface treatment for Vishay

Wafer Frontal

The semiconductor manufacturer Vishay relies on PaceTec’s equipment for setting up its semiconductor production at Telefunkenpark.

PaceTec Logo Weiss

PaceTec Gmbh
Am Niegenhirschwald 3
78120 Furtwangen
Germany

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+49 7723 65695 – 10
info@pace-tec.de

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