Customized Wet Process Solution for the Semiconductor Industry
PaceTec developed and implemented a highly complex manual wet bench for demanding cleaning and etching processes in semiconductor manufacturing. The system was specifically designed for highly corrosive process chemicals, maximum cleanroom requirements, and the highest safety standards.
With this custom wet bench solution, PaceTec once again demonstrates its expertise as a specialist in:
- Wet process systems for the semiconductor industry
- Wet benches for ISO Class 5 cleanrooms
- Chemical process systems for HF, HNO₃ and KOH processes
- PFA, ECTFE and FM4910 system construction
- Special equipment engineering for microelectronics and semiconductor manufacturing
- Automated process control and media management
Challenge: Highest Requirements for Safety, Cleanroom and Chemical Resistance
The process system requirements were extremely demanding:
- Handling of highly aggressive chemicals such as HF, H₂SO₄, HNO₃, HCl, H₂O₂ and KOH
- ISO Class 5 cleanroom compliance
- Safe separation of different process areas
- Full ATEX and EHS compliant design
- High process flexibility for different cleaning and etching processes
- Chemical-resistant materials for long-term operational safety
- Safe exhaust handling for nitrogen oxides and acid vapors
- Individually programmable process recipes
- High maintenance friendliness and maximum system uptime
PaceTec developed a custom-configured wet bench with highly resistant materials and intelligent process control.
Technical Highlights of the PaceTec Wet Bench
Cleanroom-Optimized System Design
The system was fully constructed using FM4910-compliant materials and optimized for use in highly sensitive cleanroom environments.
Key features:
- Cleanroom-grade welding seams
- Liquid-tight construction
- Separated process areas for metal and plastic tanks
- Integrated leakage monitoring
- Pneumatically controlled exhaust dampers
- LED-illuminated working area
- Safety interlocks and emergency stop systems
Highly Resistant Process Tanks for Aggressive Chemicals
The individually designed process tanks enable safe handling of:
- Hydrofluoric acid (HF)
- Sulfuric acid (H₂SO₄)
- Nitric acid (HNO₃)
- Hydrochloric acid (HCl)
- Hydrogen peroxide (H₂O₂)
- Potassium hydroxide (KOH)
Materials used:
- PFA lining
- ECTFE
- Stainless steel (VA)
- FM4910
This ensures maximum corrosion resistance and process reliability.
Intelligent Process Control for Maximum Safety
Automation functions:
- Individual recipe management
- Freely programmable process steps
- Automatic rinsing programs
- Temperature monitoring
- Level monitoring
- Media flow control
- Full process data logging
- Remote maintenance via network
- Multi-level user and password system
This intelligent control significantly reduces operator errors and improves process stability.
Focus on Environmental and Occupational Safety
PaceTec placed special emphasis on:
- CE-compliant system design
- ATEX explosion protection
- Hardware safety interlocks
- Leakage detection systems
- Nitrogen inertization
- Safe chemical waste disposal
- Energy-optimized exhaust control
- Protection against emissions and hazardous substances
The system fully complies with all relevant European safety and environmental standards.
Result: Maximum Process Safety and High System Availability
With the successful realization of this highly complex wet process system, PaceTec achieved:
- Maximum cleanroom compatibility
- Safe handling of aggressive chemicals
- High process stability
- Flexible process programming
- Reduced maintenance downtime
- Optimized chemical usage
- High operational safety
- Future-proof semiconductor manufacturing
This project clearly demonstrates PaceTec’s expertise in custom wet bench systems and chemical process equipment for the semiconductor industry.
Why PaceTec?
PaceTec develops and manufactures custom:
- Wet benches
- Wet process systems
- Semiconductor cleaning systems
- Chemical process systems
- Cleanroom equipment
- Special microelectronics systems
- HF systems
- Lift-off and etching systems
- Wafer cleaning systems
Made in Germany, designed for the highest demands in semiconductor manufacturing, MEMS production, photonics, microelectronics, R&D, and high-end cleanroom production.
